Preprint has been published in a journal as an article
DOI of the published article https://doi.org/10.1117/12.2608238
Preprint / Version 1

UV line beam for display manufacturing

##article.authors##

  • Andreas Heimes Trumpf Laser- und Systemtechnik
  • Martin Wimmer
  • Torsten Beck
  • Christian Stolzenburg
  • Julian Hellstern
  • Christoph Tillkorn
  • Sören Richter
  • Thomas Zeller

DOI:

https://doi.org/10.31224/2215

Abstract

UV line beam optics are nowadays an integral part of manufacturing chains in semiconductor and display technology. Amongst others the most prominent applications are the large area annealing of semiconductor materials and the laser lift off process used e.g. for debonding of exible displays. Here we report on a very flexible platform based on our DPSSL technology and a wavelength of 343 nm. This laser technology provides superior reliability combined with very high pulse energy stabilities. Within our optical design the beam shape along the scan direction can be either gaussian or tophat. We show which fluences can be achieved depending on beam shape and beam width and refer to the relevant applications.

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Posted

2022-03-07

License

Copyright (c) 2022 Andreas Heimes, Martin Wimmer, Torsten Beck, Christian Stolzenburg, Julian Hellstern, Christoph Tillkorn, Sören Richter, Thomas Zeller

Creative Commons License

This work is licensed under a Creative Commons Attribution 4.0 International License.