Producing Platinum Resistant Nanolayer by Electrodeposition Method and Investigation of its Behavior in Acidic and Chloride Media

Abstract

The purpose of this study is obtaining resistant platinum coating in acidic and chloride media. In this regard, gold coating as an interlayer coated on copper substrate was selected as the most beneficial substrate for platinum plating according to the study among different substrates. In this study, Chronoamprometry (constant potential) method was conducted as the electrodeposition process and scanning electron microscope (SEM) images were utilized to investigate the coating morphology. Cyclic voltammetry (CV) tests were performed in the hydrochloric acid bath to check the durability and stability of the resultant pt. coating. The results show that the resistant platinum coating has been obtained.