Preprint / Version 3

Physical Dilemma of Large-Area Advanced-Node Chips: Irreversible Narrowing of Interconnect Channels

##article.authors##

  • Ao Li Independent Researcher

DOI:

https://doi.org/10.31224/6828

Keywords:

Advanced Node, Interconnect Channel, Narrowing Effect, Resistance, Thermal Dissipation, Chiplet, Mature Process, Physical Limit

Abstract

Under the current physical laws, there are only two pathways to improve chip computing power: first, scaling down the process to increase transistor density, and second, directly expanding the chip area. Both approaches are constrained by geometric boundaries and fundamental physical laws, and have approached their limits at advanced technology nodes. Starting from geometry, quantum mechanics, thermodynamics, and statistical physics, this paper systematically demonstrates the device-level physical bottlenecks of advanced-node single chips, including quantum tunneling, voltage scaling failure, and uncontrolled statistical fluctuations. It points out the exponential yield degradation of large-area chips and reveals that Chiplet and advanced packaging only shift costs rather than eliminate fundamental contradictions caused by interconnect narrowing, such as drastic resistance increase, thermal runaway, signal crosstalk, and thermomechanical reliability failure. Results show that advanced-node chips cannot achieve large-area integration while maintaining acceptable signal integrity and heat dissipation capability. Based on physical constraints, this paper proposes the only feasible solution: mature-node Chiplet, which reduces interconnect pressure through low transistor density and implements system integration with traditional packaging, returning to a physically self-consistent design paradigm.

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Posted

2026-04-15 — Updated on 2026-04-29

Versions

Version justification

This revision clarifies the core argument: the paper critiques not advanced nodes themselves, but the industry's default application of them to all scenarios. Key additions include a discussion of the RC delay advantage of mature-node interconnects and the controllability-usability inversion as nodes approach ~1 nm. References have been updated and properly cited throughout the text. Title and section headings have been revised to better reflect the scope of the argument.