Preprint / Version 6

Physical Dilemma of Large-Area Advanced-Node Chips: Irreversible Narrowing of Interconnect Channels

##article.authors##

  • Ao Li Independent Researcher

DOI:

https://doi.org/10.31224/6828

Keywords:

Advanced Node, Interconnect Channel, Narrowing Effect, Resistance, Thermal Dissipation, Chiplet, Mature Process, Physical Limit, RC Delay, Controllability

Abstract

The two pathways to increasing chip computing power—process scaling and chip area expansion—have both reached their physical and economic limits. This paper demonstrates that the physical bottlenecks of advanced nodes and the contradictions of interconnect narrowing cannot be resolved by 2.5D/3D packaging or chiplet architectures, which merely shift costs rather than eliminate fundamental physical constraints. Industrial remedies are shown to create markets out of their own self-inflicted problems. As sub-1 nm nodes approach, uncontrollability overtakes usability. The only physically self-consistent path forward is a system-integration paradigm centered on mature-node chiplets, where wide interconnects, low thermal density, and traditional packaging together respect fundamental physical laws.

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Posted

2026-04-15 — Updated on 2026-05-06

Versions

Version justification

This is a substantial revision. Key changes include: upgrading the interconnect pressure analysis to a quantitative comparison based on real AMD product data (advanced-node chips bear approximately 13× the transistors per unit lateral surface area); adding a new section on the limitations of industrial remedies, examining SerDes, NoC, 3D integration, and optical interconnects; restructuring the signal integrity and thermal runaway sections to introduce the two-dimensional cross-sectional lock-in argument; and reordering sections so that the chain of reasoning tightens from diagnosis through remedies to physical endgame and the path forward. References have been renumbered to match the order of citation in the text.